5th INTERNATIONAL CONFERENCE ON THE FRONTIERS OF PLASMA PHYSICS AND TECHNOLOGY

18-22 April 2011, Singapore, Republic of Singapore


ELECTRON HOLE PLASMA IN SOLIDS INDUCED BY ULTRASHORT XUV LASER PULSES

B. Rethfeld and N. Medvedev

Department of Physics and OPTIMAS Research Center, Technical University of Kaiserslautern, Germany


Abstract.  Irradiation of solids with ultrashort XUV laser pulses leads to an excitation of electrons from the valence band and deeper shells to the conduction band leading to a nonequilibrium highly energetic electron{hole plasma.

We investigate the transient electron dynamics in a solid semiconductor and metal (silicon and aluminum, respectively) under irradiation with a femtosecond VUV to XUV laser pulse as used in experiments with the Free Electron Laser FLASH at DESY in Hamburg, Germany. Applying the Asymptotical Trajectory Monte-Carlo technique, we obtain the transient energy distribution of the excited and ionized electrons within the solid. Photon absorption by electrons in different bands and secondary excitation and ionization processes are simulated event by event. The method was extended in order to take into account the electronic band structure and Pauli's principle for electrons in the conduction band.

In this talk we review our results on the dynamics of the transient electron-hole plasma, in particular its transient density and energy distribution in dependence on laser and material parameters. For semiconductors we introduce the concept of an "effective energy gap" for collective electronic excitation, which can be applied to estimate the free electron density after high-intensity ultrashort XUV laser pulse irradiation [1]. For aluminum we demonstrate that the electronic spectra depend on the relaxation kinetics of the excited electronic subsystem. Experimentally observed spectra of emitted photons from irradiated aluminum [2] can be explained well with our results.

[1] N. Medvedev and B. Rethfeld, Europhys. Lett. 88, 55001 (2009).
[2] U. Zastrau, C. Fortmann, et al., Phys. Rev. E 78, 006406 (2008).