5th INTERNATIONAL CONFERENCE ON THE FRONTIERS OF PLASMA PHYSICS AND TECHNOLOGY

18-22 April 2011, Singapore, Republic of Singapore


EVALUATION OF OPTICAL PROPERTIES OF CARBON NANO STRUCTURES COATING ON ALUMINUM SUBSTRATE BY PLASMA ENHANCED CVD

Zahra Khalaj, Mahmood Ghoranneviss, Zohreh Ghorannevis, Shahriar Mirpour

Plasma Physics Research Center, science and Research Branch, Islamic Azad University, Tehran, Iran, P.O.BOX:14665-678


Abstract.  The valence electron of carbon form in different chemical bonds by means of three different hybridization: SP, SP2 and SP3 which leads to formation of various carbon nanostructures. The different types of carbon allotroups, specially diamond, has a great influence on material’s properties. In this work we investigated the growth of nanocrystalline diamonds (NCD) on an aluminium substrate by DC plasma-enhanced chemical vapor deposition (DC-PECVD) system. The growth precursors consisted of methane diluted into H2 gas. The experiment was done in CVD reactor after the first pretreatment of the substrate using He, He-N2 and He-O2 Plasma jet, separately and respectively. The results show the intensive changes on surface properties before and after deposition. A possible growth scheme, based on qualitative analysis by scaning electron microscopy (SEM), Raman spectroscopy, X-ray diffraction (XRD), atomic force microscopy (AFM) and spectrophotometer, is presented in this paper. Results will be discussed in full paper.

Key Words: Plasma jet system, Nanocrystalline diamond, plasma etching.

Paper