IAEA-CN-115-24 · Fabrication of Polymeric Photonic Structures using Proton Beam Writing

A.A. Bettiol¹, T.C. Sum¹, S. Venugopal Rao², V.I.T.A. Lohmann³, J.A. van Kan¹ and F. Watt¹

¹ Centre for Ion Beam Applications, Department of Physics, National University of Singapore, Singapore 117652
² Department of Physics, Indian Institute of Technology Guwahati, North Guwahati 781039, Assam, India.
³ Department of Applied Physics, Eindhoven University of Technology, The Netherlands

Abstract: Proton Beam Writing is a direct write lithographic process that has been developed at the Centre for Ion Beam Applications, National University of Singapore. The technique utilizes a beam of MeV protons focused down to a spot size typically less that 1 μm and scanned in a predetermined pattern over a sample, usually a polymer. The fabrication technique can be utilized for various applications including for microphotonics, microfluidics, lab-on-a-chip technology and for making stamps and moulds for nanoimprinting. Proton Beam Writing allows one to both pattern and modify the optical properties of a material at the submicron scale making it well suited to making microphotonic structures

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